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Clarycon Nanotechnology Research is a dynamic platform that facilitates collaboration between companies seeking technical expertise and seasoned independent specialists specializing in semiconductor manufacturing and nanotechnology. By harnessing the collective knowledge and experience of our experts, we aim to eliminate the repetitive nature of problem-solving in these fields. Valuable insights and solutions often lie within published academic work, which our team meticulously explores on behalf of busy engineers in the fast-paced semiconductor industry. At Clarycon, we strive to expedite your journey towards innovative solutions by connecting you with a network of exceptionally knowledgeable industry experts.


Behind the Scenes

At Clarycon Nanotechnology Research, we have an exceptional team of consultants with expertise in various areas. We’re committed to solving complex business challenges using the latest technology and data resources, combined with our creative and collaborative strategic approach. Learn more about some of our talented professionals below.

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In 2023, Thorsten Lill founded Clarycon Nanotechnology Research, leveraging his extensive 30 years of experience in semiconductor processing. He published an influential review on low temperature etching. With a remarkable track record, he has co-authored over 110 peer-reviewed articles and holds an impressive portfolio of 98 patents. Among others, he published a review on low temperature etching "Dry etching in the presence of physisorption of neutrals at lower temperatures". Thorsten Lill is also recognized for his contribution to the field as the author of the widely acclaimed textbook, "Atomic Layer Processing: Semiconductor Dry Etching Technology", which delves into the intricacies of plasma and atomic layer etching.



Andreas Fischer is a renowned expert in the field of plasma research. With a wealth of knowledge and expertise, he has specialized in working with various low-temperature plasma sources. He has authored an authoritative review on the subject of thermal atomic layer etching "Thermal atomic layer etching: A review".

Andreas Fischer's contributions extend beyond his published review. He has an impressive track record, having authored more than 100 peer-reviewed scientific papers, further demonstrating his commitment to advancing the field of plasma research. In recognition of his innovative work, he has been granted over 100 patents, solidifying his position as a pioneer in the field.



Qinghuang Lin is a renown expert in logic front and backend integration. He is a SPIE fellow, ACS fellow, PMSE fellow, and POLY fellow. He has over 120 granted patens and over 100 published papers to his name. He received the Industrial Polymer Scientist Award in 2018, the Roy W. Tess Award in 2020, and the E.V. Murphree Award in2023. His course training course on logic device integration is a popular fixtures at the SPIE Advanced Lithography and Patterning conference for over 10 years. 

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